Lecturer

Matt Gallagher is a Lecturer in the Electrical and Biomedical Engineering Department at the University of Vermont. Holding a PhD in Physics from Dartmouth College, with a focus on non-linear fiber optics, he specializes in semiconductor devices and micro-circuit process integration in his teaching.

In collaboration with local employers, Matt ensures the curriculum remains relevant to semiconductor technology. He brings in outside experts, coordinates equipment donations, and facilitates connections for students' career options. Additionally, his expertise extends to embedded systems engineering, particularly in micro-controllers and programmable logic devices.

With a decade-long tenure at IBM Microelectronics in CMOS and bipolar technology development before joining UVM, Matt remains actively engaged in the Microelectronics industry. He spent two recent sabbaticals at imec in Leuven, Belgium, contributing to advancements in next-generation microchip technology.

Publications

"EPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D."J-H. Franke, M. Gallagher, et al., SPIE Advanced Lithography, Extreme Ultraviolet (EUV) Lithography, San Jose, CA 2017.

“Single exposure EUV patterning of BEOL metal layers on the imec iN7 platform” V. Blanco, M. Gallagher, et al., SPIE Advanced Lithography, Extreme Ultraviolet (EUV) Lithography, San Jose, CA 2017.

“Keeping it Simple: An Introductory Microcontroller Course using the HCS08” M. Gallagher, J Murphy, A. St.Denis, American Society of Engineering Education Annual Conference, Austin, TX 2009.

“Effects of in-situ arsenic-doped amorphous silicon emitter process on SiGe heterojunction bipolar transistors” M. Gallagher, M. Rice,G. Langdeau,L. Lanzerotti,M. Dupuis, R. Johnson,L. Stern, E. Sanchez, C. Chen, Advanced Semiconductor Manufacturing Conference and Workshop, Boston, 1999.

“Control schemes using emission endpoint in a borderless oxide contact etch process” M. Gallagher, C. Ebel, J. Fournier, T. Weeks, G. MacDougall, T. Knotts, Chung Lam, K. Peterson, Advanced Semiconductor Manufacturing Conference and Workshop, Boston, 1996.

“A novel, borderless metal-to-diffusion contact technique” M. Gallagher, C. Ebel, G. MacDougall, T. Weeks, Advanced Semiconductor Manufacturing Conference and Workshop, Boston, 1995.

H.Patrick,S.L. Gilbert, A. Lidgard, M.D. Gallagher . “Annealing of Bragg gratings in hydrogen‐loaded optical fiber.” 78.5 (1995):pp 2940 – 2945.

M.D. Gallagher, U.L. Osterberg. “Spectroscopy of Germanium-Doped Optical Fibers.” Journal of Applied Physics 74.4, (1993): pp 2771-2778.

M.D. Gallagher, U.L. Osterberg . “Time resolved 3.10 eV luminescence in germanium‐doped silica glass.” Applied Physics Letters 63.22 (1993): pp 2987-2989.

M.D. Gallagher, U.L. Osterberg.” Observation of direct correlation between induced absorption and second harmonic generation in germanium-doped glass optical fibres .” 28.13(1992):pp 1251 – 1252.

M.D. Gallagher, U.L. Osterberg. “Ultraviolet absorption measurements in single‐mode optical glass fibers.“ 60.15(1992):pp 1791 – 1793.

Lecturer Matt Gallagher

Areas of Expertise and/or Research

Semiconductor process integration, semiconductor devices, lithography, micro-controllers, embedded systems.

Education

  • Dartmouth College, PhD. Physics
  • University of Vermont, BS. Engineering Physics

Contact

Email:

86mgalla@uvm.edu

Office Location:

Votey 379

Courses Taught

  • EE 3420 / PHYS 3165 Integrated Circuit Fabrication
  • EE 3440 / PHYS 3675 Semiconductor Devices and Materials
  • EE 3815 Microcontroller Systems
  • EE 2845 Digital Control with Embdded Systems
  • EE 1100 EE Principals and Design
  • EE 2185 Circuits Design Project
  • EE 2175 Electrreica,Circuits and Sensors
  • EE 106 Embedded Programming in C