Department of Physics: Condensed Matter Theory Group
Condensed Matter & Materials Science Seminar
Thursday, April 18th, 2013
Jeff UlbrandtDepartment of Physics, UVM
"Inert-Gas Aggregation of Nanoparticles in Magnetron Sputtering"
Sputter Deposition is one of the standard methods for the deposition of thin films. A well-known transition from compressive stress to tensile stress in sputtered thin-films occurs above a critical deposition pressure. Previous research carried out at UVM  showed that the cause of this transition can be explained by the sputtered vapor forming nanoparticles prior to depositing on the substrate. A system capable of directly measuring these nanoparticles has been developed utilizing a quadrupole mass spectrometer. Data from the mass spectrometer as well as X-ray scattering data on films deposited from nanoparticles is presented for two materials; Copper and Tungsten Disilicde (WSi2).  L Zhou et al. Phys. Rev. B 82, 075408 (2010)
Last modified April 16 2013 01:45 PM